- All sections
- G - Physics
- G03F - Photomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices; materials therefor; originals therefor; apparatus specially adapted therefor
- G03F 1/32 - Attenuating PSM [att-PSM], e.g. halftone PSM or PSM having semi-transparent phase shift portion; Preparation thereof
Patent holdings for IPC class G03F 1/32
Total number of patents in this class: 360
10-year publication summary
23
|
25
|
27
|
48
|
37
|
36
|
32
|
51
|
26
|
12
|
2015 | 2016 | 2017 | 2018 | 2019 | 2020 | 2021 | 2022 | 2023 | 2024 |
Principal owners for this class
Owner |
All patents
|
This class
|
---|---|---|
Hoya Corporation | 2822 |
136 |
Shin-Etsu Chemical Co., Ltd. | 5132 |
49 |
Taiwan Semiconductor Manufacturing Company, Ltd. | 36809 |
17 |
SK Enpulse Co., Ltd. | 103 |
14 |
Dai Nippon Printing Co., Ltd. | 3891 |
12 |
Boe Technology Group Co., Ltd. | 35384 |
11 |
Agc, Inc. | 4029 |
11 |
Samsung Display Co., Ltd. | 30585 |
10 |
Toppan Photomask Co., Ltd. | 56 |
9 |
Shenzhen China Star Optoelectronics Technology Co., Ltd. | 8635 |
7 |
Samsung Electronics Co., Ltd. | 131630 |
5 |
Shenzhen China Star Optoelectronics Semiconductor Display Technology Co., Ltd. | 3454 |
5 |
Hoya Electronics Singapore Pte. Ltd. | 7 |
5 |
ASML Netherlands B.V. | 6816 |
4 |
Toppan Printing Co., Ltd. | 2212 |
4 |
Nikon Corporation | 7162 |
3 |
Beijing BOE Display Technology Co., Ltd. | 2497 |
3 |
ULVAC Coating Corporation | 17 |
3 |
Wuhan China Star Optoelectronics Technology Co., Ltd. | 3894 |
3 |
S&S Tech Co., Ltd. | 26 |
3 |
Other owners | 46 |